Aixtron AIX G5WW SiC (8 x150 mm) Planetary System

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AIX G5 WW SiC Planetary Reactor for deposition on 8 x150 mm ( 10 x100 mm ) wafers

2014 model, system equipped with EpiCurve TT and 2 Ebara ESA80W-HDF Dry Pump.

MOCVD system for 1600℃

Configuration:

1. MO-G2-D Double Standard Gas Channel x3

    2 x SiH4 : 2 x RunCenter

    2 x C3H8 : 1 x RunCenter , 1 x RunBottom

    2 x HCl : 2 x RunHCl

2. MO-G2/G4-D Combined standard and dilution/dopant gas channel x 1

    2 x N2 : 2 x Center

3. MO-G2 Standard gas channel with pusher, for low flow x 1

    1 x Cl2H2Si

4. MO-G6 Dummy Line x 1

    1 x Center

5. MO-differential run/vent pressure balancing

    1 x Center

More information available on request.