Nanometrics RPM2000

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Nanometrics RPM2000 Rapid Photoluminescence Mapper - 404nm laser

The RPM2000 Rapid Photoluminescence Mapper is a fast, room temperature photoluminescence (PL) mapping system suitable for use in R&D, production and quality control environments. 

Photoluminescence is a well-established, non-contact, non-destructive technique used in the development and process control of semiconductors, with room temperature PL wafer maps giving vital information on the uniformity of alloy composition, material

quality and defects in substrates, epilayers and device structures. 

The RPM2000 has been designed specifically to obtain whole wafer PL maps in a mere fraction of the time previously associated with this sort of measurement, giving the ability to measure and assess wafers between production runs. The primary benefit is that rapid feedback and remedial action can be implemented should wafer parameters be out of specification, avoiding wasted production runs thus saving time and costs. In addition, the speed of measurement also makes the incoming inspection and qualification of bought-in wafers a quick and easy task. 

Laser System - 404nm laser

Monochrometer : Triple Grating

Detector : CCD

System Dimensions :

780mm(w) x 700mm(D) x510mm(H)

Weight excluding PC : 78kg

More information available on request.