Configuration:
Upgrade of TurboDisc K300 GaN MOCVD , 8x3" configuration to TurboDisc K465i GaN, 12x4''(54x2") wafers/run
The system is installed and available for demonstration by appointment.
System equipped with RealTemp 200 Monitoring System and DRT-210 Real-time In-situ Monitoring System.
. Curvature of Epi-wafer
. Layer Thickness and Refractive Index
. Wafer Pocket Temperature with Wafer Reflection Compensation.
Source configuration
MO Source with 1 set TMGa, 1 set TEGa, 1 set TMAl, 2 set Cp2Mg, 2 sets TMIn.
System equipped with 2 sets Lauda RE235 and 3 sets Lauda RE215 thermal baths
More information available on request.