MOCVD (FEOL) Equipment / Ion Implanter / VARIAN Ion implanter 300XP

  • 1200002
  • 1200002
  • 1200002
  • 1200002
  • 1200002
  • 1200002
  • 1200002

VARIAN Ion implanter 300XP

Throughput : 250 wafers per hour with 10-second implant, using both end stations, all wafer sizes, with standard (5 x 10-6 Torr) interlock.

Wafer Handling :

1. Cassette-to-cassette serial processing

2.3-6'' wafer size capability

3. dual end stations

4. full 100 wafer handling

5. Cassette and slot integrity

6. azimuthal wafer orientation

7. implant angle 0o or 7o fixed

More information available on request.