MOCVD (FEOL) Equipment / Mask Aligners / Japan Science Engineering Co.,Ltd. MA4200, Auto Mask Aligner

  • 1141005
  • 1141005
  • 1141005
  • 1141005
  • 1141005
Configuration:
 
MA4200 exposure system is an all function in one facility printing patterns on photoresist-coated substrates aligned with a mask. MA4200 provides a fully automatic and high-speedy system on substrate loading, alignment, exposure and unloading to increase production efficiency which is ideal for LED, wafer Mems Industries.
 
High-speed, high-accurate exposure performance
Low operation cost, High productivity
Auto alignment on wafers
High efficient dual arm robot handling system
 
Substrate Size ~ Sapphire, GaN 2"- 4"
Mask Size ~ 5"x5"
Light source ~ Super-high pressure 500W lamp  1
Intensity uniformity ~ 5%
 

More information available on request.