MOCVD (FEOL) Equipment / Reactors / VEECO TurboDisc K465i Upgrade GaN , 12x4"(54x2")

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Configuration:

Upgrade of TurboDisc K465 GaN , 45x2" configuration to TurboDisc K465i GaN, 12x4''(54x2") wafers/run

The system is installed and available for demonstration by appointment.

System equipped with RealTemp 200 Monitoring System and DRT-210 Real-time In-situ Monitoring System.

. Curvature of Epi-wafer

. Layer Thickness and Refractive Index

. Wafer Pocket Temperature with Wafer Reflection Compensation.

Source configuration

MO Source with  1 set TMGa,  1 set TEGa, 1 set TMAl, 1 set Cp2Mg, 2 sets TMIn.

System equipped with 2 sets Lauda RE235 and 3 sets Lauda RE215 thermal baths

More information available on request.